CVD Equipment Corporation (NASDAQ:CVV – Get Free Report) was the recipient of a significant decline in short interest in the month of December. As of December 15th, there was short interest totaling 10,076 shares, a decline of 28.9% from the November 30th total of 14,172 shares. Approximately 0.2% of the shares of the company are short sold. Based on an average daily trading volume, of 17,016 shares, the days-to-cover ratio is currently 0.6 days. Based on an average daily trading volume, of 17,016 shares, the days-to-cover ratio is currently 0.6 days. Approximately 0.2% of the shares of the company are short sold.
Wall Street Analysts Forecast Growth
Separately, Weiss Ratings reiterated a “sell (e+)” rating on shares of CVD Equipment in a research note on Wednesday, October 8th. One research analyst has rated the stock with a Sell rating, According to data from MarketBeat, the company has an average rating of “Sell”.
Read Our Latest Research Report on CVV
CVD Equipment Stock Performance
CVD Equipment (NASDAQ:CVV – Get Free Report) last issued its earnings results on Monday, November 10th. The industrial products company reported $0.06 EPS for the quarter. The business had revenue of $7.41 million during the quarter. CVD Equipment had a negative return on equity of 0.72% and a negative net margin of 0.66%.
Institutional Inflows and Outflows
A hedge fund recently raised its stake in CVD Equipment stock. Citadel Advisors LLC boosted its holdings in shares of CVD Equipment Corporation (NASDAQ:CVV – Free Report) by 93.6% in the 3rd quarter, according to its most recent Form 13F filing with the SEC. The firm owned 41,382 shares of the industrial products company’s stock after buying an additional 20,011 shares during the period. Citadel Advisors LLC owned approximately 0.60% of CVD Equipment worth $139,000 as of its most recent SEC filing. 31.59% of the stock is currently owned by hedge funds and other institutional investors.
CVD Equipment Company Profile
CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.
The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.
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