CVD Equipment (NASDAQ:CVV) Shares Pass Above Two Hundred Day Moving Average – What’s Next?

CVD Equipment Corporation (NASDAQ:CVV) crossed above its 200-day moving average during trading on Monday . The stock has a 200-day moving average of $3.57 and traded as high as $4.19. CVD Equipment shares last traded at $3.99, with a volume of 38,220 shares trading hands.

Wall Street Analyst Weigh In

Separately, Weiss Ratings restated a “sell (e+)” rating on shares of CVD Equipment in a report on Wednesday, January 21st. One research analyst has rated the stock with a Sell rating, Based on data from MarketBeat.com, the stock presently has an average rating of “Sell”.

CVD Equipment Stock Up 0.3%

The stock has a market capitalization of $27.76 million, a price-to-earnings ratio of -199.90 and a beta of 0.97. The firm has a 50-day moving average of $3.94 and a two-hundred day moving average of $3.57.

Institutional Investors Weigh In On CVD Equipment

A number of institutional investors have recently modified their holdings of CVV. Dimensional Fund Advisors LP grew its holdings in shares of CVD Equipment by 5.2% during the 3rd quarter. Dimensional Fund Advisors LP now owns 71,689 shares of the industrial products company’s stock valued at $241,000 after acquiring an additional 3,556 shares in the last quarter. Citadel Advisors LLC boosted its position in CVD Equipment by 93.6% during the third quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock valued at $139,000 after purchasing an additional 20,011 shares during the last quarter. Finally, DRW Securities LLC purchased a new position in CVD Equipment in the fourth quarter valued at about $45,000. Institutional investors and hedge funds own 31.59% of the company’s stock.

CVD Equipment Company Profile

CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.

The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.