CVD Equipment (NASDAQ:CVV) Raised to Hold at Wall Street Zen

CVD Equipment (NASDAQ:CVV) was upgraded by investment analysts at Wall Street Zen to a “hold” rating in a research note issued to investors on Saturday.

Separately, Weiss Ratings reiterated a “sell (e+)” rating on shares of CVD Equipment in a report on Wednesday, January 21st. One investment analyst has rated the stock with a Sell rating, According to MarketBeat, the company presently has a consensus rating of “Sell”.

CVD Equipment Price Performance

NASDAQ:CVV opened at $3.34 on Friday. CVD Equipment has a 1-year low of $2.46 and a 1-year high of $5.86. The firm has a 50-day moving average of $4.20 and a two-hundred day moving average of $3.69. The stock has a market cap of $23.17 million, a P/E ratio of -166.92 and a beta of 1.01.

Hedge Funds Weigh In On CVD Equipment

Several hedge funds have recently made changes to their positions in the business. Dimensional Fund Advisors LP increased its holdings in shares of CVD Equipment by 5.2% in the third quarter. Dimensional Fund Advisors LP now owns 71,689 shares of the industrial products company’s stock valued at $241,000 after buying an additional 3,556 shares in the last quarter. Citadel Advisors LLC grew its position in CVD Equipment by 93.6% during the 3rd quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock worth $139,000 after purchasing an additional 20,011 shares in the last quarter. Finally, DRW Securities LLC purchased a new stake in CVD Equipment in the 4th quarter worth about $45,000. Institutional investors and hedge funds own 31.59% of the company’s stock.

About CVD Equipment

CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.

The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.