CVD Equipment (NASDAQ:CVV) Upgraded at Wall Street Zen

Wall Street Zen upgraded shares of CVD Equipment (NASDAQ:CVV) from a sell rating to a hold rating in a research report released on Saturday.

Separately, Weiss Ratings reaffirmed a “sell (d-)” rating on shares of CVD Equipment in a report on Friday, June 5th. One equities research analyst has rated the stock with a Sell rating, Based on data from MarketBeat.com, the company currently has an average rating of “Sell”.

CVD Equipment Stock Down 0.4%

CVV opened at $8.04 on Friday. CVD Equipment has a twelve month low of $2.76 and a twelve month high of $9.10. The company’s 50-day moving average price is $7.34 and its two-hundred day moving average price is $5.78. The stock has a market cap of $55.88 million, a price-to-earnings ratio of 5.54 and a beta of 1.25.

Hedge Funds Weigh In On CVD Equipment

A number of institutional investors and hedge funds have recently added to or reduced their stakes in the business. Algert Global LLC purchased a new position in shares of CVD Equipment in the second quarter worth about $224,000. BlackRock Inc. purchased a new stake in shares of CVD Equipment during the 2nd quarter valued at approximately $130,000. FNY Investment Advisers LLC bought a new position in CVD Equipment in the 2nd quarter worth approximately $305,000. Renaissance Technologies LLC boosted its holdings in CVD Equipment by 17.5% in the 1st quarter. Renaissance Technologies LLC now owns 180,882 shares of the industrial products company’s stock worth $749,000 after buying an additional 27,000 shares during the period. Finally, DRW Securities LLC purchased a new position in CVD Equipment in the 4th quarter valued at approximately $45,000. Institutional investors own 31.59% of the company’s stock.

CVD Equipment Company Profile

CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.

The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.